Introducing the EQ-RTP-1000D4 Vacuum Furnace, a compact and efficient rapid thermal processing solution ideal for annealing semiconductor wafers or solar cells up to 3" in diameter. Equipped with a 4" I.D. processing quartz tube and a vacuum flange, this furnace offers precise temperature control with ±1°C accuracy. The 10KW halogen light heating system ensures a rapid heating rate of up to 120°C/second. It includes a 50-segment temperature controller and RS485 port for easy monitoring via PC. Perfect for high-quality thermal processing needs, this vacuum furnace is available for sale from our reliable selection.
Vacuum Furnace
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Question & Answers For:
Vacuum Furnace
Past Questions, Helpful Answers.
q.
What materials can be processed in this vacuum furnace?
a.
The EQ-RTP-1000D4 Vacuum Furnace is designed for rapid thermal processing of semiconductor wafers and solar cells up to 3" in diameter. It is suitable for annealing and other thermal treatments requiring precise temperature control.
q.
How does the furnace achieve rapid heating?
a.
This furnace utilizes a 10KW halogen light heating system, enabling a rapid heating rate of up to 120°C per second, ensuring efficient and uniform thermal processing.
q.
What is the temperature control accuracy of the furnace?
a.
The furnace provides precise temperature control with an accuracy of ±1°C, ensuring consistent and reliable processing results.
q.
Can the furnace be monitored and controlled via a computer?
a.
Yes, it includes an RS485 port that allows easy monitoring and control via a PC, providing enhanced process management and automation capabilities.
q.
What is the size of the processing chamber?
a.
The furnace is equipped with a 4" I.D. processing quartz tube, offering a controlled environment for high-quality thermal treatments.
q.
Does the furnace include programmable temperature control?
a.
Yes, it features a 50-segment temperature controller, allowing users to program complex heating and cooling profiles for precise thermal processing.
q.
What vacuum level can this furnace achieve?
a.
The furnace comes with a vacuum flange, enabling users to integrate a suitable vacuum pump to achieve the required vacuum level for specific applications. However, the vacuum pump itself is not included.
q.
Is this furnace suitable for research and industrial applications?
a.
Yes, the EQ-RTP-1000D4 is designed for both research laboratories and industrial applications requiring precise rapid thermal processing of small-scale materials.
q.
What power supply does this furnace require?
a.
The furnace requires a 10KW power supply, ensuring sufficient energy to achieve its high heating rates.
q.
Can this furnace handle multiple processing cycles per day?
a.
Yes, the furnace is built for reliability and can handle multiple thermal processing cycles per day, making it ideal for frequent use in research and production settings.